Under Construction
The intention of this Learning Center Section is to provide the reader with the tools and guides to determine which Electron Gun Beam System would provide the specifications and functions needed for your application. It may be helpful if the reader first goes through the Electron Gun Beam System Tutorial to become familiar with the basic principles and terminology.
The first section below, the Electron Gun Beam Selection Guide, provides a roadmap to finding the best system for your application in our portfolio of Electron Gun Beam Systems. It guides the user by answering a sequence of questions that include application, major system specifications, and then determining other necessary features and options.
The Electron Gun Beam System Application Table Matrix section allows the reader who already knows what their specific application and specifications are to efficiently look through our selection of electron gun beam systems.
The next section of Electron Gun Beam System Energy Comparison Tables divides the our Electron Gun Beam System selections into High, Medium and Lower energy selections and then provide other associated information such as beam current ranges, spot size ranges, and working distance to then quickly determine which system and features would be optimal for your application.
In the final section, Electron Gun Beam Systems Cathodes / Electron Emitters we provide a summary of the characteristic of cathodes that are available for use in our Electron Gun Beam System. Please note that several factors determine which cathodes are available in a particular system (not all cathodes are available for all systems).
If your application is significantly different or would be a custom application using our Electron Gun Beam Systems and Optics, please reach out to Kimball Physics to speak directly with our Physicists and/or Engineers to see what may be possible with our advanced technology.
Please download our Electron Beam System Selection Guide: Summary Form PDF document to summarize your research looking for the Electron Gun Beam System for your application.
The Electron Gun Beam Selection Guide, provides a flow path to finding the best system in our portfolio of Electron Gun Beam Systems. It provides a “flow path” to answering a sequence of questions that include Application, major system specifications, and then determining other necessary features and options.
This tool provides a efficient path to find your own existing application and quickly find the Electron Gun Beam System with the needed specifications. The table provides tooltips with quick access to the Electron Gun Specs, the respective product page, and a PDF document with more in depth information about the system.
The Red Circles in the Matrix Table suggest which Electron Gun (Beam) System may be suitable for a particular application.
Kimball Physics products have evolved into a broad range of electron beam systems that we arbitrarily characterized as low energy (up to 5 keV), medium (up to 30 keV) and high (up to 100 keV) energy systems. Many of the systems were born from custom projects, which still is a large portion of our focus.
Low Energy Systems, with energy ranges from 1 eV up to 5 keV, currents ranging from 1 nA to 2 mA, and spot sizes from 0.5 mm to 100 mm are available.
The tables below provide comparison of the Electron Gun System specifications and the typical Applications and Features for each Low Energy Electron Gun System.
Low Energy Electron Gun Systems (<5 keV)
Medium Energy Systems, with energy ranges from 100 eV up to 30 keV, currents ranging from 1 nA to 5 mA, and spot sizes of 60 microns to 450 mm are available.
The tables below provide comparison of the Electron Gun System specifications and the typical Applications and Features for each Medium Energy Electron Gun System.
Medium Energy Electron Gun Systems (<30 keV)
High Energy Systems, with energy ranges from 1 keV up to 100 keV, currents ranging from 1 nA to 2 mA, and spot sizes from 50 micron to 500 mm are available.
The tables below provide comparison of the Electron Gun System specifications and the typical Applications and Features for each High Energy Electron Gun System.
High Energy Electron Gun Systems (< 100 keV)
Kimball Physics designs and manufactures a broad range of high performance electron emitters to meet the diverse needs of our customers. Designed for high brightness, long life, or rugged reliability, these emitters are used in Kimball Physics electron guns and the high performance instruments and tools of our customers. Cathodes/emitters are available as both standard products and custom designs, and applications include electron microscopy, lithography, x-ray generation, free electron lasers, electron accelerators, and more.
Not all cathodes are available for all Electron Gun Beam Systems. The selection of the cathode is based on several parameters such as expected vacuum conditions, energy spread, emission current and density, and brightness requirements. The chart below provides insight into the features of each of the cathode types available at Kimball Physics for use in our Electron Gun Beam Systems.
Electron Beam System Selection Guide: Summary Form PDF document to summarize your research looking for the Electron Gun Beam System for your application.
Electron Gun (Beam) Systems
Electron Gun (Beam) Systems Product Documents (PDF)
Select PDF Document(s) below:
Low Energy Systems (<5 keV)
EFG-7 / EGPS-1017 | EFG-7 / EGPS-2017 | EGA-1012 / EGPS-1012 |
EGL-2022 / EGPS 2022 | ELG-2 / EGPS-1022 | FRA-2X1-2 / EGPS-1011 |
Medium Energy Systems (<30 keV)
EGG-3101 / EGPS-3101 | EGG-3103 / EGPS-3103 | EGF-3104 / EGPS-3104 |
EMG-4212 / EGPS-3212 | EMG-4212 / EGPS-4212 | EMG-4215 / EGPS-4215 |
EGF-4104 / EGPS-4104 | EMG-4210 / EGPS-4210 | EMG-4193 / EGPS-4193 |
High Energy Systems (< 100 keV)
EGH-6210 / EGPS-6210 | EGH-6002 / EGPS-6002 | EGF-6104 / EGPS-6104 |
EGF-6115 / EGPS-6115 (Please see EGF-6104) | EGH-8100 / EGPS-8100 | EGH-8105 / EGPS-8105 |
EGH-8103 / EGPS-8103 | EGH-8201 / EGPS-8201 |
Notes:
COPYRIGHT KIMBALL PHYSICS 2025, ALL RIGHTS RESERVED
EG System | Cathode | Energy Dual Range | Emission Dual Range | Energy and Emission Dual Range | High Current | Deflection / Focus | Raster | Pulsing | De-mountable | Other Customizations |
(1) FRA-2X1-2 /EGPS-1011:
Tier 1 |
Ta, Y2O3 | -Pneumatic Faraday Cup
-FC 2×1 Manual Rotary Faraday Cup -Port Aligner (± 2 degree) |
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Tier 2 | Ta, Y2O3 | Dual-range Energy and Dual-range Emission DR-E/i (-1kV/-100V, 500uA/50uA) | GP – Dual-grid Pulsing
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Tier 3 | Ta, Y2O3 | Dual-range Energy DR-E (-1kV/-100V), | CP – Capacitive Pulsing | |||||||
(2) ELG-2 /EGPS-1022
Tier 1 |
Ta, Y2O3 | Dual-range Energy DR-E (-2kV/-200V) | Defl – Electrostatic Deflection
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CP – Capacitive Pulsing | -Manual Faraday Cup
-FC-2/PA-200 Pneumatically Actuated Faraday Cup [mounted on housing] -Port Aligner (± 2 degree) -Software Raster Generator
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Tier 2 | Ta, Y2O3 | Dual-range Energy and Dual-range Emission DR-E/i (-2kV/-200V, 20uA/2uA) | Defl – Electrostatic Deflection
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GP – Dual-grid Pulsing
CP – Capacitive Pulsing |
Demountable | |||||
Tier 3 | Ta, Y2O3 | Dual-range Energy and Dual-range Emission DR-E/i (-2kV/-200V, 20uA/2uA) | Defl – Electrostatic Deflection
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GP – Dual-grid Pulsing
CP – Capacitive Pulsing |
Demountable | |||||
(3) EFG-7 /EGPS-1017 | Ta, Y2O3 | Defl – Electrostatic Deflection
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-Emission High/Low Range
-Port Aligner(+/- 2 degrees) -Manual Faraday Cup -FC-2/PA-200 Pneumatically Actuated Faraday Cup -High Current (up to 1 mA) -Capacitive Pulsing (external Pulse generator required) -Software Raster -Hardware Raster
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Tier 2 | Ta, Y2O3 | Dual-range Energy DR-E (-1.5kV/-150V) | Defl – Electrostatic Deflection
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GP – Dual-grid Pulsing
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Tier 3 | Ta, Y2O3 | Dual-range Energy DR-E (-1.5kV/-150V)
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Defl – Electrostatic Deflection
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GP – Dual-grid Pulsing
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Demountable | |||||
EG System | Energy
Dual Range |
Emission
Dual Range |
Energy and Emission
Dual Range |
High Current | Deflection / Focus | Raster | Pulsing | De-mountable | ||
(4) EGA-1012 /EGPS-1012 | Y2O3 | -Emission High / Low Range
-Energy Low Range -Capacitive Pulsing -Port Aligner (+/- 2 degrees) -Dual Grid Pulsing |
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(5) EGL-2022 /EGPS-2022
Tier 1 |
Ta, Y2O3 | Defl – Electrostatic Deflection
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-Port Aligner (+/- 2 degrees)
-Small Spot -Software Raster (requires LabVIEW) -Hardware Raster Generator
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Tier 2 | Ta, Y2O3 | Dual-range Energy and Dual-range Emission DR-E/i (5kV/500V, 500uA/50uA) | Defl – Electrostatic Deflection
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GP – Dual-grid Pulsing
CP – Capacitive Pulsing |
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Tier 3 | Ta, Y2O3 | Raster | GP – Dual-grid Pulsing
CP – Capacitive Pulsing |
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(6)EGG-3101 /EGPS-3101 | Ta | Defl – Electrostatic Deflection | -Port Aligner (+/- 2 degrees)
-Hardware Raster Generator -Dual Grid Pulsing 2us-DC -Software Raster (requires LabVIEW) -FC-2/PA-200 Pneumatically Actuated Faraday Cup [mounted on housing]
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Tier 2 | Ta, Y2O3 | Defl – Electrostatic Deflection | CP – Capacitive Pulsing
BB-Beam Planking |
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Tier 3 | Ta | Dual-range Emission DR-i (2mA/200uA) | HC– High Current | Defl – Electrostatic Deflection | CP – Capacitive Pulsing
BB-Beam Planking |
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(7) EGG-3103 /EGPS-3103-
Tier 1 |
Y2O3 | All options included in Tiers | ||||||||
Tier 2 | Y2O3 | Defl – Electrostatic Deflection | ||||||||
Tier 3 | Y2O3 | HC– High Current | Defl – Electrostatic Deflection | GP – Dual-grid Pulsing
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EG System | Energy
Dual Range |
Emission
Dual Range |
Energy and Emission
Dual Range |
High Current | Deflection / Focus | Raster | Pulsing | De-mountable | ||
(8) EGF-3104 /EGPS-3104: Tier 1 | Ta | -Port Aligner (+/- 2 degrees)
-Software Raster -Hardware Raster -Dual Grid Pulsing (2us-DC) |
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Tier 2 | Ta | Mag Defl (x2) | ||||||||
Tier 3 | Ta, Y2O3 | Dual-range Emission DR-i (2mA/200uA) | HC– High Current | Mag Defl (x2) | ||||||
(9) EMG-4212 /EGPS-4212: Tier 1 | Ta, Y2O3 | Dual-range Emission DR-i (500uA/50uA), | Defl – Electrostatic Deflection | -Software Raster (requires LabVIEW)
-Hardware Raster -Beam Blanking -Small Spot Size -Capacitive Pulsing -High Current Option(up to 1 mA) |
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Tier 2 | Ta, Y2O3 | Defl – Electrostatic Deflection | GP – Dual-grid Pulsing
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Tier 3 | Ta | Dual-range Emission DR-i (500uA/50uA), | Defl – Electrostatic Deflection | BB
Beam Dump |
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(10) EMG-4215 /EGPS-4215: Tier 1 | LaB6 | Defl – Electrostatic Deflection | -Software Raster (requires LabVIEW)
-Hardware Raster |
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Tier 2 | LaB6 | Defl – Electrostatic Deflection | GP – Dual-grid Pulsing
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(11) EGF-4104 /EGPS-4104: Tier 1 | Y2O3 | -Port Aligner (+/- 2 degrees)
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Tier 2 | Y2O3 | Mag Defl (x2) | ||||||||
Tier 3 | Ta
Y2O3 |
HC– High Current | Mag Defl (x2) | GP – Dual-grid Pulsing
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(12) EMG-4210 /EGPS-4210: Tier 1 | LaB6 | Mag Defl (x2) & Lens | -Dual Grid Pulsing (2us-DC) | |||||||
Tier 2 | LaB6 | HC– High Current | Mag Defl (x2) & Lens | |||||||
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EG System | Energy
Dual Range |
Emission
Dual Range |
Energy and Emission
Dual Range |
High Current | Deflection / Focus | Raster | Pulsing | De-mountable | ||
(13) EGF-6104 /EGPS-6104 Tier 1 | Y2O3 | Mag Defl (x2) | -Port Aligner (+/- 2 degrees)
-Software Raster -Hardware Raster -Dual Grid Pulsing (2us-DC) |
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Tier 2 | Y2O3 | HC– High Current | Mag Defl (x2) | |||||||
(14)EGH-6210 EGPS-6210: Tier 1 | LaB6 | Mag Defl (x4)/Lens | -Port Aligner (+/- 2 degrees)
-Beam Washing (Hardware, Software) -Beam Shaping (not compatible with beam washing) |
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Tier 2 | LaB6 | Dual-range Emission DR-i (10mA/1mA) | Mag Defl (x4)/Lens | GP – Dual-grid Pulsing
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Tier 3 | LaB6 | Dual-range Emission DR-i (10mA/1mA) | HC– High Current | Mag Defl (x4)/Lens | GP – Dual-grid Pulsing
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(15) EGH-6002 EGPS-6002 | Ta | Mag Defl (x2)/Lens | -High Current Option (up to 1 mA)
-Small Spot Option (LaB6, better than 10-7 torr) |
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Ta
(LaB6 small spot option) |
Mag Defl (x2)/Lens | GP – Dual-grid Pulsing
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*EGH-8100 EGPS-8100 | Several options but not listed website options check boxes | |||||||||
*EGH-8103 EGPS-8103 | -Dual Grid Pulsing (2us-DC)
-High Current (up to 1 mA) -Small Spot Option (LaB6, 10-7 torr or better) |
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*EGH-8105 EGPS-8105 | Several options but not listed website options check boxes | |||||||||
*EGH-8201 EGPS-8201 | Several options but not listed website options check boxes | |||||||||