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The intention of this Learning Center Section is to provide the reader with the tools and guides to determine which Electron Gun Beam System would provide the specifications and functions needed for your application. It may be helpful if the reader first goes through the Electron Gun Beam System Tutorial to become familiar with the basic principles and terminology.
The first section below, the Electron Gun Beam Selection Guide, provides an Interactive “MindMap” roadmap to finding the best system for your application in our portfolio of Electron Gun Beam Systems. It can be expanded / contracted to guides the user through the process of selecting a system by providing a sequence of topics that include the application, major system specifications, with then further detailed information to determine what other features and options may be needed.
The Electron Gun Beam System Application Table Matrix section allows the reader who already knows what their specific application and specifications are to efficiently look through our selection of electron gun beam systems.
The next section of Electron Gun Beam System Energy Comparison Tables divides the our Electron Gun Beam System selections into Low, Medium and High Energy selections and then provides other associated information such as beam current ranges, spot size ranges, and working distance to help determine which system and features would be optimal for your application.
In the Electron Gun Beam Systems Cathodes / Electron Emitters we provide a summary of the characteristic of cathodes that are available for use in our Electron Gun Beam System. Please note that several factors determine which cathodes are available in a particular system (not all cathodes are available for all systems).
In the Descriptions Features, Options, Customizations section, we provide descriptions of the various capabilities available for the Electron Gun Beam Systems.
The final section provides a list of Electron Gun Beam System Tier System Features found in our pre-configured Tier Systems, with comparison tables to further show how the features are grouped into packages. A list of addition customizations that may be available is also provided.
If your application is significantly different or would be a custom application using our Electron Gun Beam Systems and Optics, please reach out to Kimball Physics to speak directly with our Physicists and/or Engineers to see what may be possible with our advanced technology.
PLEASE DOWNLOAD our Electron Beam System Selection Guide: Summary Form PDF document to assist you in summarizing your research looking for the Electron Gun Beam System for your application.
The Electron Gun Beam Selection Guide, provides a flow path to finding the best system in our portfolio of Electron Gun Beam Systems. It provides a “flow path” to answering a sequence of questions that include Application, major system specifications, and then determining other necessary features and options.
This tool provides a efficient path to find your own existing application and quickly find the Electron Gun Beam System with the needed specifications. The table provides tooltips with quick access to the Electron Gun Specs, the respective product page, and a PDF document with more in depth information about the system.
The Red Circles in the Matrix Table suggest which Electron Gun (Beam) System may be suitable for a particular application.
Kimball Physics products have evolved into a broad range of electron beam systems that we arbitrarily characterized as low energy (up to 5 keV), medium (up to 30 keV) and high (up to 100 keV) energy systems. Many of the systems were born from custom projects, which still is a large portion of our focus.
Low Energy Systems, with energy ranges from 1 eV up to 5 keV, currents ranging from 1 nA to 2 mA, and spot sizes from 0.5 mm to 100 mm are available.
The tables below provide comparison of the Electron Gun System specifications and the typical Applications and Features for each Low Energy Electron Gun System.
Low Energy Electron Gun Systems (<5 keV)
Medium Energy Systems, with energy ranges from 100 eV up to 30 keV, currents ranging from 1 nA to 5 mA, and spot sizes of 60 microns to 450 mm are available.
The tables below provide comparison of the Electron Gun System specifications and the typical Applications and Features for each Medium Energy Electron Gun System.
Medium Energy Electron Gun Systems (<30 keV)
High Energy Systems, with energy ranges from 1 keV up to 100 keV, currents ranging from 1 nA to 2 mA, and spot sizes from 50 micron to 500 mm are available.
The tables below provide comparison of the Electron Gun System specifications and the typical Applications and Features for each High Energy Electron Gun System.
High Energy Electron Gun Systems (< 100 keV)
Kimball Physics designs and manufactures a broad range of high performance electron emitters to meet the diverse needs of our customers. Designed for high brightness, long life, or rugged reliability, these emitters are used in Kimball Physics electron guns and the high performance instruments and tools of our customers. Cathodes/emitters are available as both standard products and custom designs, and applications include electron microscopy, lithography, x-ray generation, free electron lasers, electron accelerators, and more.
Not all cathodes are available for all Electron Gun Beam Systems. The selection of the cathode is based on several parameters such as expected vacuum conditions, energy spread, emission current and density, and brightness requirements. The chart below provides insight into the features of each of the cathode type available at Kimball Physics for use in our Electron Gun Beam Systems.
Kimball Physics Electron Gun /Beam Systems typically come as a complete system, and include
Several of the features listed below may be included in a pre-configured Tier Level systems or packages for a particular electron gun system. Addition features, depending on the system, may be available as options / add-ons / customizations that can be included in systems for additional cost. These features include:
Dual Grid Pulsing: This option adds an additional, fixed voltage power supply in series with the variable grid supply which can be activated via an integrated TTL circuit. This option adds a standard BNC connection on the rear panel for TTL signal input. Used to completely cutoff emission from the cathode surface. Not usable simultaneously with emission current control (ECC). Feature requires external pulse generator. TTL pulse width 2us to DC, frequency up to 5 kHz. 500 ns rise/fall time.
*Software generated TTL signal available with appropriate software options and hardware
Pulsing, Capacitive: Both variable grid and blanker pulsing can be operated using a capacitive pulse junction box, which combines additively the output from the EGPS and an external high voltage (HV) signal generator. This option allows for shorter pulse width (20 ns to 100 us) with a ~10 ns rise/fall time. Frequency is power and duty cycle limited, see system manual for more details.
*Note: Capacitive Grid Pulsing is standard on all mounted ELG-2 systems*
To LEARN more about pulsing, please visit Beam Pulsing in the Beam Operation section of the Electron Gun Tutorial in the Learning Center.
Beam Blanking: Adds a copper beam blanking aperture in the optics column before the focus element. Applying a voltage to the aperture shunts the electron beam into a trap, effectively stopping emission from the end of the gun. Voltage is supplied by a variable power supply within the EGPS which can be toggled on/off via TTL input. This option adds a standard BNC connection on the rear panel for TTL signal input. Can be used simultaneously with ECC. Requires external pulse generator. TTL pulse width 1us to DC, frequency up to 5 kHz. 500 n/s rise/fall time.
*Software generated TTL signal available with appropriate software options
Beam Blanking, High Current: For systems with both high current and beam blanking options available, the blanking aperture is modified to account for higher current and different electrode geometry. Provides all the same functionality as standard beam blanking.
Adds a second metering circuit to the EGPS for the purpose of higher resolution metering and control with a lower maximum emission value. The circuits can be switched between using a TTL switch embedded in the EGPS unit either through the front panel, software, or the rear panel analog input. The Low range offers a factor of 10 greater resolution at up to 10% the maximum emission current of the High range (e.g., 3.000 mA / 300.0 uA).
Adds a second metering circuit to the EGPS for the purpose of higher resolution metering and control with a lower maximum energy value. The circuits can be switched between using a TTL switch embedded in the EGPS unit either through the front panel, software, or the rear panel analog input. The Low range offers a factor of 10 greater resolution at up to 10% the maximum energy of the High range (e.g., 2000.0 eV / 200.00 eV).
Replaces the standard firing unit in the electron gun system with a higher current firing unit. In the cases of disc emitters, this typically involves increasing the diameter of the emitter surface, though in some cases cathode material may change. Please see option details on each system for more information.
Replaces the standard firing unit in the electron gun system with a firing unit optimized for smaller spots. Generally, this involves replacing the cathode with a precision micro-flat LaB6 cathode, though some systems may differ. Please see option details on each system for more information.
Some gun systems offer multiple cathode material options without significantly changing gun performance. To LEARN more about cathodes, please visit our Cathodes Product Page or visit our Learning Center. Also, please contact Kimball Physics if you need assistance determining which cathode option is best suited to your application.
Raster Generation: Adds the ability to rapidly move the beam along the two deflection axes of the gun system by ramping the voltages or currents of the deflection elements at user set frequencies. User can also set the center and relative amplitude of the raster pattern. Each axis can be adjusted independently. Available through two options:
To LEARN more about rastering, please visit Deflection / Rastering the Electron Gun Tutorial found in the Learning Center.
Functionally identical to raster generation, though using magnetic deflection instead of electrostatic. Same options apply.
Adds a small faraday cup to the mouth of the electron gun as well as a BNC connector on the mounting flange to read out current. Power input limit 2W. Increases in vacuum clearance requirements.
To LEARN more about Faraday cups, please visit the Faraday Cup Product page or our Learning Center.
Several electrostatic and magnetostatic options are available for defection and focus capabilities, including electrostatic deflection, 2 and 4 pole magnetostatic deflection, two pole magnetostatic deflection and focusing, and four pole magnetostatic deflection and focusing.
For more information about electron beam focus an deflection, please visit the Electron Optics in the Electron Gun Tutorial in the Learning Center..
The basic Kimball Physics software package offers all the front panel functionality from a virtual instrument on the user’s computer. System control is executed through simple serial commands.
For Electron Guns: The firing unit is the assembly component of the electron gun that emits the electrons; the assembly that can be replaced as a unit, usually consisting of the complete triode (cathode, grid (Wehnelt) and anode) or just the cathode and grid; in some guns, only a part of the firing unit called the firing unit cartridge needs to be replaced. In some systems, it is possible for customers with technical capability to replace the firing unit.
A list of the Features available in the Electron Gun Beam System Tier Packages, and addition customizations available for Customized Systems, are provided below.
Tables then follow to provide easy comparison of features in the various pre-configured System Tier Packages. The Tables are grouped by Low, Medium and High Energy Systems.
Electron Beam System Selection Guide: Summary Form PDF document to summarize your research looking for the Electron Gun Beam System for your application.
Electron Gun (Beam) Systems
Electron Gun (Beam) Systems Product Documents (PDF)
Select PDF Document(s) below:
Low Energy Systems (<5 keV)
| EFG-7 / EGPS-1017 | EFG-7 / EGPS-2017 | EGA-1012 / EGPS-1012 |
| EGL-2022 / EGPS 2022 | ELG-2 / EGPS-1022 | FRA-2X1-2 / EGPS-1011 |
Medium Energy Systems (<30 keV)
| EGG-3101 / EGPS-3101 | EGG-3103 / EGPS-3103 | EGF-3104 / EGPS-3104 |
| EMG-4212 / EGPS-3212 | EMG-4212 / EGPS-4212 | EMG-4215 / EGPS-4215 |
| EGF-4104 / EGPS-4104 | EMG-4210 / EGPS-4210 | EMG-4193 / EGPS-4193 |
High Energy Systems (< 100 keV)
| EGH-6210 / EGPS-6210 | EGH-6002 / EGPS-6002 | EGF-6104 / EGPS-6104 |
| EGF-6115 / EGPS-6115 (Please see EGF-6104) | EGH-8100 / EGPS-8100 | EGH-8105 / EGPS-8105 |
| EGH-8103 / EGPS-8103 | EGH-8201 / EGPS-8201 |
Notes:
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